40 CFR Appendix Table 2 to Subpart MMM of Part 63 - Table 2 to Subpart MMM of Part 63—Standards for New and Existing PAI Sources

Emission source	Applicability	Requirement
Process vents	Existing:
	Processes having uncontrolled organic HAP emissions ≥0.15 Mg/yr	90% for organic HAP per process or to outlet concentration of ≤20 ppmv TOC.
	Processes having uncontrolled HCl and chlorine emissions ≥6.8 Mg/yr	94% for HCl and chlorine per process or to outlet HCl and chlorine concentration of ≤20 ppmv.
	Individual process vents meeting flow and mass emissions criteria that have gaseous organic HAP emissions controlled to less than 90% on or after November 10, 1997	98% gaseous organic HAP control per vent or ≤20 ppmv TOC outlet limit.
	New:
	Processes having uncontrolled organic HAP emissions ≥0.15 Mg/yr	98% for organic HAP per process or ≤20 ppmv TOC.
	Processes having uncontrolled HCl and chlorine emissions ≥6.8 Mg/yr and <191 Mg/yr	94% for HCl and chlorine per process or to outlet concentration of ≤20 ppmv HCl and chlorine.
	Processes having uncontrolled HCl and chlorine emissions ≥191 Mg/yr	99% for HCl and chlorine per process or to outlet concentration of ≤20 ppmv HCl and chlorine.
Storage vessels	Existing: ≥75 m 3 capacity and vapor pressure ≥3.45 kPa	Install a floating roof, reduce HAP by 95% per vessel, or to outlet concentration of ≤20 ppmv TOC.
	New: ≥38 m 3 capacity and vapor pressure ≥16.5 kPa	Same as for existing sources.
	≥75 m 3 capacity and vapor pressure ≥3.45 kPa	Same as for existing sources.
Wastewater a	Existing: Process wastewater with ≥10,000 ppmw Table 9 compounds at any flowrate or ≥1,000 ppmw Table 9 compounds at ≥10 L/min, and maintenance wastewater with HAP load ≥5.3 Mg per discharge event	Reduce concentration of total Table 9 compounds to <50 ppmw (or other options).
	New:
	Same criteria as for existing sources	Reduce concentration of total Table 9 compounds to <50 ppmw (or other options).
	Total HAP load in wastewater POD streams ≥2,100 Mg/yr.	99% reduction of Table 9 compounds from all streams.
Equipment leaks	Subpart H	Subpart H with minor changes, including monitoring frequencies consistent with the proposed CAR.
Product dryers and bag dumps	Dryers used to dry PAI that is also a HAP, and bag dumps used to introduce feedstock that is a solid and a HAP	Particulate matter concentration not to exceed 0.01 gr/dscf.
Heat exchange systems	Each heat exchange system used to cool process equipment in PAI manufacturing operations	Monitoring and leak repair program as in HON.

a Table 9 is listed in the appendix to subpart G of 40 CFR part 63.