mask work

(2)a “mask work” is a series of related images, however fixed or encoded— (A)having or representing the predetermined, three-dimensional pattern of metallic, insulating, or semiconductor material present or removed from the layers of a semiconductor chip product; and (B)in which series the relation of the images to one another is that each image has the pattern of the surface of one form of the semiconductor chip product;


17 USC § 901(a)(2)

Scoping language

As used in this chapter
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