mask work

(2) a “mask work” is a series of related images, however fixed or encoded— (A) having or representing the predetermined, three-dimensional pattern of metallic, insulating, or semiconductor material present or removed from the layers of a semiconductor chip product; and (B) in which series the relation of the images to one another is that each image has the pattern of the surface of one form of the semiconductor chip product;


17 USC § 901(a)(2)

Scoping language

As used in this chapter
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