Subchapter 21 - ANALYTICAL X-RAY INSTALLATIONS
- § 7:28-21.1 - Scope
- § 7:28-21.2 - Definitions
- § 7:28-21.3 - General equipment requirements
- § 7:28-21.4 - Additional equipment requirements for open beam x-ray systems
- § 7:28-21.5 - Additional equipment requirements for enclosed beam X-ray systems
- § 7:28-21.6 - Operating procedures
- § 7:28-21.7 - Analytical x-ray equipment with a high voltage supply that cannot operate at potentials above 16 kilovolts
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