40 CFR Appendix Table I-12 to Subpart I of Part 98 - Default Emission Factors (1-Uij) for Gas Utilization Rates (Uij) and By-Product Formation Rates (Bijk) for Semiconductor Manufacturing for Use With the Stack Test Method

Table I-12 to Subpart I of Part 98—Default Emission Factors (1-Uij) for Gas Utilization Rates (Uij) and By-Product Formation Rates (Bijk) for Semiconductor Manufacturing for Use With the Stack Test Method

Table I-12 to Subpart I of Part 98—Default Emission Factors (1-Uij) for Gas Utilization Rates (Uij) and By-Product Formation Rates (Bijk) for Semiconductor Manufacturing for Use With the Stack Test Method

[300 mm and 450 mm Wafers]

All processes Process gas i
CF4 C2F6 CHF3 CH 2F2 CH 3F C3F8 C3F8 Remote C4F8 NF3 NF3
Remote
SF 6 C4F6 C5F8 C4F8O
1-Ui 0.65 0.80 0.37 0.20 0.30 0.30 0.063 0.183 0.19 0.018 0.30 0.15 0.100 NA
BCF4 NA 0.21 0.076 0.060 0.029 0.21 NA 0.045 0.040 0.037 0.033 0.059 0.109 NA
BC2F6 0.058 NA 0.058 0.043 0.0093 0.18 NA 0.027 0.0204 NA 0.041 0.062 0.083 NA
BC4F6 0.0083 NA 0.01219 NA 0.001 NA NA 0.008 NA NA NA NA NA NA
BC4F8 0.0046 NA 0.00272 0.054 0.007 NA NA NA NA NA NA 0.0051 NA NA
BC3F8 NA NA NA NA NA NA NA NA NA NA NA NA 0.00012 NA
BCH2F2 0.005 NA 0.0024 NA 0.0033 NA NA 0.0021 0.00034 0.00088 0.000020 0.000030 NA NA
BCH3F 0.0061 NA 0.027 0.0036 NA 0.0007 NA 0.0063 0.0036 0.0028 0.0082 0.00065 NA NA
BCHF3 0.012 NA NA 0.057 0.016 0.012 NA 0.028 0.0106 0.000059 0.0039 0.017 0.0069 NA
BF2 NA NA NA NA NA NA NA NA NA 0.50 NA NA NA NA
[89 FR 31922, Apr. 25, 2024]