40 CFR Appendix Table I-8 to Subpart I of Part 98 - Default Emission Factors (1-UN2O,j) for N2O Utilization (UN2O,j)

Table I-8 to Subpart I of Part 98—Default Emission Factors (1-UN2O,j) for N2O Utilization (UN2O,j)

Table I-8 to Subpart I of Part 98—Default Emission Factors (1-UN2O,j) for N2O Utilization (UN2O,j)

Manufacturing type/process type/wafer size N2O
Semiconductor Manufacturing:
200 mm or Less:
CVD 1-Ui 1.0
Other Manufacturing Process 1-Ui 1.0
300 mm or greater:
CVD 1-Ui 0.5
Other Manufacturing Process 1-Ui 1.0
LCD Manufacturing:
CVD Thin Film Manufacturing 1-Ui 0.63
All other N2O Processes 1.0
[89 FR 31921, Apr. 25, 2024]